Hybrid 3D Laser Micro- Nano- Fabrication System
The Hybrid 3D Laser Micro-Nano Fabrication System (Ultrafast Laser Nanofactory) by Femtika is the only platform in the product range that...
Hybrid 3D Laser Micro- Nano- Fabrication System
Hybrid 3D Laser Micro Fabrication System for Ultrafast, High-Precision Micro and Nano Manufacturing
The Hybrid 3D Laser Micro-Nano Fabrication System (Ultrafast Laser Nanofactory) by Femtika is the only platform in the product range that combines additive and subtractive femtosecond laser processes within a single workstation — integrating Multiphoton Polymerisation (MPP) for sub-200 nm 3D polymer printing, Selective Laser Etching (SLE) for enclosed 3D glass microstructuring, laser ablation for surface micro-machining, and laser cutting for thin substrate singulation — with ±300 nm positioning accuracy, 1 nm stage resolution, 780/1030/515 nm wavelengths, pulse durations as short as 50 fs, repetition rates from 11 MHz to 100 MHz, 160×160×60 mm travel at 200 mm/s, and an expandable open architecture — enabling the fabrication of fully integrated micro-nano devices combining polymer 3D printed structures, glass microfluidic channels, surface-machined features, and precision-cut substrates within a single workflow at a single workstation — for biomedical microneedles, tissue scaffolds, optofluidics, micro-robotics, photonics, MEMS, semiconductor packaging, and next-generation R&D — available in India exclusively through United Spectrum Instruments, official Femtika distributor.
The Nanofactory Concept: Why Combining Additive and Subtractive Processes on One Platform is a Paradigm Shift
Every other laser micromachining platform in this product range is a subtractive system — it removes material. The SLE system combines subtractive surface machining with subtractive internal etching, but both are fundamentally material-removal processes. The Hybrid 3D Nanofactory is categorically different: it is the only platform in the range that adds Multiphoton Polymerisation (MPP) — a genuine additive manufacturing process that builds up three-dimensional polymer structures by selectively curing photopolymer resin within a tightly focused femtosecond laser spot — to the subtractive capabilities of SLE, laser ablation, and laser cutting. This additive-subtractive hybrid capability is not a convenience: it is the enabling requirement for a new class of micro-nano device whose function depends on a combination of 3D-printed polymer micro-elements and precisely machined glass or semiconductor features that cannot be achieved on any single-process platform. A micro-robotic gripper that requires both a compliant 3D-printed polymer structure and a rigid glass substrate mounting point; a lab-on-chip that requires both SLE-etched glass microfluidic channels and MPP-printed polymer valve actuators on the same substrate; a photonic device that requires both laser-written glass waveguides and MPP-printed polymer micro-lenses aligned to the waveguide facets — all of these require the hybrid additive-subtractive capability that only the Femtika Nanofactory provides.
Key performance fact:
The Hybrid 3D Nanofactory achieves ±300 nm positioning accuracy with 1 nm stage resolution — the finest resolution specification in the entire product range — with pulse durations as short as 50 fs and repetition rates up to 100 MHz. At 1 nm resolution, the system can position the laser focal spot in increments of 1 nanometre — enabling the sub-wavelength feature definition required by Multiphoton Polymerisation for 200 nm 3D printed features and the precise volumetric glass modification uniformity required by SLE for high-selectivity etch patterning. The 50 fs minimum pulse duration is the shortest in the range — at 50 fs, the temporal confinement of energy deposition is extreme enough for the most demanding cold-ablation applications, including fabrication of nanostructured surfaces with sub-100 nm feature precision and two-photon polymerisation at voxel sizes approaching the diffraction limit.
Understanding Hybrid 3D Laser Micro Fabrication System | Ultrafast Laser Nanofactory System
What are the four core processes integrated in the Hybrid 3D Nanofactory?
The Hybrid 3D Laser Micro Fabrication System is a multifunctional femtosecond laser workstation that unifies four core processes within one platform. Multiphoton Polymerisation (MPP) uses tightly focused femtosecond pulses to locally cure photopolymer resin through two-photon absorption — printing true three-dimensional polymer structures with sub-200 nm feature resolution at any location within the resin volume, enabling freeform 3D micro-printing without supports or layer-wise restriction. Selective Laser Etching (SLE) uses femtosecond pulses to modify transparent glass at the focal volume, enabling selective chemical etching that creates enclosed 3D channels, cavities, and voids inside glass substrates. Laser ablation removes material from surfaces of glass, metals, polymers, and semiconductors through cold femtosecond pulse interaction for surface texturing, micro-machining, and pattern definition. Laser cutting uses the same femtosecond source to singulate thin substrates, dice wafers, and contour-cut thin films and membranes. By unifying all four processes within one workstation — sharing the same precision stages, focusing optics, and alignment reference frame — the system eliminates the inter-machine registration errors that accumulate when these processes are performed on separate platforms.
What is Multiphoton Polymerisation (MPP) and why does it achieve sub-200 nm feature sizes?
Multiphoton Polymerisation (also called Two-Photon Polymerisation or 2PP) is a laser 3D printing process where the photopolymerisation reaction in a light-sensitive resin is initiated only at the focus of a tightly focused femtosecond laser beam — not throughout the entire irradiated volume as in conventional UV photopolymerisation. The two-photon absorption cross-section of the photoinitiator molecule is non-zero only at the extremely high intensities achievable at the diffraction-limited focal volume of a high-NA objective lens. This nonlinear threshold response means that the polymerisation volume (called the voxel — the smallest 3D element that can be polymerised in a single position) is smaller than the laser wavelength — breaking the conventional optical diffraction limit that constrains the minimum feature size of single-photon photopolymerisation. With 780 nm femtosecond pulses focused through a high-NA objective, the MPP voxel can be as small as 150–300 nm in the lateral direction — enabling solid polymer micro-structures with sub-wavelength feature resolution that is not achievable by any single-photon 3D printing or UV lithography process. By scanning this sub-diffraction voxel through the full three-dimensional volume of the resin, arbitrary 3D geometries — including overhangs, enclosed cavities, spiral structures, and complex freeform shapes — are built without the layer-by-layer restrictions and support structure requirements of conventional additive manufacturing.
Technical Specifications
| Parameter | Specification |
|---|---|
| Wavelength | 780 nm, 1030 ± 10 nm, 515 ± 10 nm |
| Repetition Rate | 100 MHz, 11 MHz … 76 MHz |
| Pulse Duration | < 100 fs, 50 fs, 120 fs, 170 fs |
| Travel (X / Y / Z) | 160 mm × 160 mm × 60 mm |
| Accuracy (X / Y / Z) | ± 300 nm |
| Resolution (X / Y / Z) | 1 nm |
| Maximum Speed (X / Y) | 200 mm/s |
| Dimensions (W × L × H) | 1790 mm × 920 mm × 2270 mm |
| Weight | ~700 kg |
Key Features and Advantages
All-in-One Hybrid Additive and Subtractive Fabrication — Unique in the Product Range
Combines Multiphoton Polymerisation (additive 3D printing), Selective Laser Etching (subtractive internal glass structuring), laser ablation (subtractive surface machining), and laser cutting (subtractive singulation) in a single workstation — enabling uninterrupted hybrid fabrication workflows without part repositioning and without inter-machine registration errors. This additive-subtractive hybrid capability is the defining unique feature of the Femtika Nanofactory within the product range, and it is the enabling technology for a new class of integrated micro-nano devices that require both 3D-printed polymer micro-elements and precisely machined glass or semiconductor features within the same device architecture.
Multiphoton Polymerisation for Sub-200 nm 3D Polymer Printing
MPP capability enables freeform 3D printing of polymer structures with feature sizes down to approximately 200 nm — reaching spatial resolution beyond the conventional optical diffraction limit through the nonlinear intensity threshold of two-photon absorption. At 780 nm wavelength and high-NA focusing, the MPP voxel is sub-wavelength, allowing solid 3D polymer micro-structures — micro-lenses, scaffold architectures, micro-gears, compliant micro-mechanisms, and nano-patterned surfaces — to be built by scanning the voxel through any programmed 3D path within the photopolymer resin volume. The absence of layer-by-layer restrictions and support structure requirements of conventional additive manufacturing allows geometries including overhangs, enclosed voids, spiral structures, and multi-material hybrid assemblies that cannot be fabricated by any other 3D printing technology.
±300 nm Accuracy and 1 nm Stage Resolution — Finest in the Range
The ±300 nm positioning accuracy and 1 nm stage resolution are the finest specifications in the entire product range, enabling the sub-wavelength positional precision required for MPP nano-printing and the registration accuracy needed for precise co-fabrication of MPP polymer elements and SLE glass structures within the same device. At 1 nm resolution across 160 × 160 mm travel — processing rates up to 200 mm/s — the system combines nanometre-scale positioning precision with the working area and speed needed for practical multi-process device fabrication rather than single-point laboratory measurement.
Selective Laser Etching for Enclosed 3D Glass Microstructuring
SLE capability creates enclosed microchannels, hollow cavities, and 3D internal structures inside transparent glass substrates — as described in the dedicated SLE system page — but here integrated within the same workstation as MPP and laser ablation/cutting. This integration is what enables the co-fabrication of SLE glass microfluidic architectures with MPP polymer photonic or valve elements, registered to ±300 nm within the same fixture and without any inter-machine substrate transfer.
Multi-Wavelength Femtosecond Sources with Sub-50 fs Pulse Duration
Three wavelengths (780 nm, 1030 nm, 515 nm) and pulse durations as short as 50 fs — the shortest in the range — provide the laser parameter space needed for optimising each of the four fabrication processes: 780 nm is the primary MPP wavelength for two-photon absorption in common photoinitiators; 1030 nm provides maximum power efficiency for SLE glass modification and metallic thin-film ablation; 515 nm offers finer feature resolution and broader material absorption compatibility for surface structuring; and pulse durations from 50 fs to 170 fs span the range from extreme cold-ablation processes (50 fs for minimum HAZ and maximum nonlinear confinement) to efficient high-average-power SLE modification (longer pulses for higher per-pulse energy at lower repetition rates).
Wide Material Compatibility Across Polymers, Glass, and Semiconductors
Processes photopolymers including IP-Dip, IP-Q, OrmoComp, and other two-photon resins for MPP printing; fused silica, borosilicate glass, and quartz for SLE internal structuring; thin metals including gold, silver, and aluminium for surface ablation and patterning; semiconductor substrates including silicon and GaAs for ablation and dicing; and hybrid material assemblies combining polymer, glass, and metal layers in a single device. This breadth of material compatibility across both the additive (polymer) and subtractive (glass, metal, semiconductor) process domains directly enables the hybrid device architectures that the Nanofactory is designed to fabricate.
Seamless CAD-to-Fabrication Workflow with 3D Path Planning
Dedicated software supports standard 3D design formats with advanced slicing, toolpath generation, and real-time visualisation — managing the complex multi-process fabrication sequences of hybrid devices where MPP toolpaths, SLE scan paths, and ablation patterns must be precisely coordinated in three-dimensional space. The software understands the specific requirements of each process: MPP slice generation respects voxel overlap for structural integrity; SLE path planning manages depth-dependent aberration correction; ablation patterns specify target depth and surface finish; and cutting paths optimise kerf width and breakout quality. This integrated multi-process CAD/CAM capability eliminates the manual toolpath development and format conversion required when combining separately programmed single-process platforms.
Applications Across Industries
Biomedical and Healthcare Technologies
The Nanofactory’s combination of MPP polymer 3D printing and SLE glass microfluidic fabrication addresses the fabrication requirements of advanced biomedical microdevices — components where the biological function requires features at the intersection of additive and subtractive manufacturing. MPP-printed microneedle arrays in biocompatible photopolymers with precisely defined needle geometry for transdermal drug delivery and minimally invasive biofluid sampling; tissue engineering scaffolds with 3D-printed lattice architectures whose pore size, connectivity, and surface chemistry mimic the extracellular matrix; MPP-printed polymer housing structures with SLE-etched glass microfluidic channels for integrated implantable biosensor devices; and drug delivery microdevices combining MPP-printed reservoir structures with SLE-etched release channel networks. Relevant to IIT, AIIMS, NCBS, and CSIR biomedical research groups and medical device R&D companies developing next-generation implantable and wearable biomedical microsystems in India.
Microfluidics and Lab-on-Chip
Integration of SLE glass microfluidics and MPP polymer functional elements enables the fabrication of complete lab-on-chip devices in a single workflow — combining the chemical inertness and optical quality of glass channels with the geometric flexibility of 3D-printed polymer valves, mixers, and actuators. SLE creates the enclosed glass microchannel network; MPP prints the polymer microvalves, check valves, and membrane pump actuators that control fluid routing within the network; and laser ablation patterns the fluidic connection ports and surface alignment features. This hybrid fabrication approach produces monolithic lab-on-chip devices with performance characteristics — glass chemical resistance, polymer actuation flexibility, and precise SLE-MPP co-registration — that are not achievable by any single-process fabrication method.
Optics and Photonics
MPP printing of sub-wavelength resolution micro-optics — micro-lenses, fibre coupling tapers, beam shapers, and holographic optical elements — combined with SLE-written buried waveguides and laser-cut substrate singulation in a single workstation. MPP-printed polymer micro-optics achieve smoother surfaces and finer sub-wavelength features than any mechanical fabrication process, and their direct 3D printing on the surface of a glass substrate with SLE-written waveguides eliminates the alignment uncertainties of separately assembled micro-lens and waveguide structures. Relevant for silicon photonics packaging (MPP-printed coupling tapers on waveguide facets), photonic integrated circuit testing (MPP-printed mode field converters for probe coupling), and advanced optical instrument development (free-form MPP micro-optics for miniaturised spectrometers, microscopes, and sensing systems).
Micromechanics and Micro-Robotics
MPP printing enables fabrication of compliant micro-mechanisms — micro-springs, flexure joints, micro-grippers, actuator arms, and levers — with 3D freeform geometries that optimise the elastic compliance required for specific force-displacement relationships in micro-robotic systems. These MPP-printed polymer micro-mechanisms can be printed directly onto SLE-etched glass substrates or laser-cut thin metal or silicon stages within the same Nanofactory workflow, creating integrated micro-robotic assemblies where the compliant polymer elements and rigid substrate elements are precisely co-registered. Applied for magnetic micro-robots for minimally invasive medical procedures, resonant mechanical sensors with MPP-printed proof masses, and micro-manipulation tools for lab automation and biological research.
Semiconductor and Microelectronics
Laser ablation for wafer structuring, precision dicing, packaging component microfabrication, photonic integrated circuit interface preparation, and precision housing features — combined with MPP printing for polymer alignment structures, coupling elements, and encapsulation features that must be precisely registered to semiconductor features. In photonic chip packaging, MPP-printed polymer coupling tapers and spot-size converters can be directly printed onto the chip facet within the Nanofactory — aligned to the waveguide structure with ±300 nm accuracy — providing coupling efficiency improvement over free-space coupling without the assembly complexity of separately fabricated and aligned coupling elements.
Academic and Research Laboratories
The Femtika Nanofactory is the premier research platform for exploratory micro-nano fabrication — enabling university and national laboratory research groups to investigate new device concepts that exploit the hybrid additive-subtractive capability without requiring access to separate MPP and SLE facilities. Applied for metamaterial fabrication (MPP-printed sub-wavelength resonant polymer structures on glass or semiconductor substrates), plasmonic device research (MPP-printed polymer templates for subsequent metal deposition to form plasmonic nanostructures), microfluidic physics research (complex 3D channel networks with MPP-printed functional inserts), and next-generation biosensor development combining photonic and fluidic elements. Relevant to photonics, MEMS, materials science, and bioengineering research groups at IITs, NITs, TIFR, NCBS, CSIR, and IISER institutes across India.
Advanced Prototyping and Custom Manufacturing
Ideal for start-ups, innovation labs, and design houses requiring the broadest possible design freedom for proof-of-concept prototyping and low-volume custom manufacturing of novel micro-nano devices. The Nanofactory’s combination of four fabrication processes, nanometre stage resolution, and open expandable architecture means that a design concept that requires 3D-printed polymer elements, glass internal structures, surface-machined features, and precision-cut substrates can be realised as a functioning prototype without access to four separate specialised instruments. For India’s growing deep-tech start-up ecosystem — where photonics start-ups, biomedical microdevice companies, and precision sensor developers require access to advanced micro-nano fabrication capability without the scale to justify multiple dedicated machines — the Nanofactory’s multi-process single-platform capability provides the fabrication infrastructure needed to advance from concept to working prototype at the nanoscale.
Why Choose United Spectrum Instruments?
United Spectrum Instruments brings the Hybrid 3D Laser Micro Fabrication System to India with end-to-end technical and application support. As the official distributor of Femtika, we go beyond system supply by offering installation, commissioning, training, and long-term service. Our close collaboration with research institutions, start-ups, and industrial R&D teams ensures each system is configured for precise, application-specific success.
Official Femtika Distributor with Deep Hybrid Micro-Nano Fabrication Expertise
United Spectrum Instruments provides the complete application support scope for the Femtika Nanofactory — from pre-purchase application feasibility assessment and process route planning through installation, photopolymer selection guidance, MPP and SLE process recipe development, multi-process workflow integration, and long-term technical service. Our understanding of the nonlinear physics of two-photon polymerisation, SLE glass modification, and femtosecond ablation — combined with our experience across the biomedical, photonics, MEMS, and R&D sectors that the Nanofactory serves — enables us to provide application-specific consultation at the depth required for successful deployment of this uniquely capable technology.
- Official distributor in India for Femtika hybrid 3D laser micro fabrication systems — genuine products with full manufacturer warranty and direct Femtika application engineering support coordination for complex multi-process fabrication challenges.
- Comprehensive support covering installation, commissioning, and operator training — including multi-process workflow integration, photopolymer and etchant chemistry consultation, MPP and SLE process recipe development, and CAD/CAM software training for hybrid device fabrication.
- Application specialists for use-case-specific configuration and optimisation — we assess your specific device architecture, identify which of the four processes are required and in what sequence, recommend the optical configuration (wavelengths, objective NA, beam shaping) for your smallest feature requirement, and configure the expansion modules needed for your application roadmap
FAQs
What makes the Hybrid 3D Laser Nanofactory different from standard laser microfabrication tools?
The Femtika Hybrid 3D Laser Nanofactory is the only platform in the product range that combines additive manufacturing (Multiphoton Polymerisation — 3D printing of polymer structures with sub-200 nm feature resolution) with subtractive processes (SLE internal glass structuring, laser ablation for surface machining, and laser cutting) within a single workstation. This additive-subtractive hybrid capability enables the fabrication of a completely new category of integrated micro-nano devices — combining polymer 3D-printed micro-elements with glass microfluidic channels, surface-machined semiconductor features, and precision-cut substrates — all co-registered to ±300 nm within the same workholding fixture, without inter-machine substrate transfer and the alignment errors it introduces. No single-process platform can address this fabrication requirement. Available in India through United Spectrum Instruments.
What is Multiphoton Polymerisation (MPP) and what feature sizes does it achieve?
Multiphoton Polymerisation (MPP), also called Two-Photon Polymerisation (2PP), is a laser 3D printing process where a femtosecond laser beam focused to a diffraction-limited spot inside a photopolymer resin initiates polymerisation only at the focal volume through nonlinear two-photon absorption — breaking the conventional optical diffraction limit. The polymerised voxel (the 3D printing element) can be as small as approximately 150–200 nm laterally at 780 nm wavelength with a high-NA objective. By scanning this sub-wavelength voxel through any programmed 3D path, arbitrary polymer geometries — including overhangs, enclosed voids, and complex freeform shapes impossible in conventional additive manufacturing — can be built with sub-200 nm feature resolution
Can embedded microchannels inside glass be fabricated on this system?
Yes. The Selective Laser Etching (SLE) capability of the Hybrid 3D Nanofactory creates complex, enclosed microchannels and hollow structures inside transparent glass substrates — using femtosecond laser modification of the glass volume followed by selective chemical etching that removes only the laser-modified regions. The defining advantage over a standalone SLE system is that these SLE-fabricated glass microfluidic channels are co-fabricated with MPP-printed polymer elements — valves, actuators, optical coupling structures — in the same workstation at ±300 nm registration accuracy, enabling fully integrated hybrid optofluidic and microfluidic devices that cannot be assembled from separately fabricated components.
What is the minimum feature size achievable on the Hybrid 3D Nanofactory?
In Multiphoton Polymerisation (MPP) mode, features down to approximately 200 nm can be achieved in 3D-printed polymer structures, depending on the photopolymer resin, objective numerical aperture, and laser pulse parameters. In laser ablation mode, surface features to approximately 1–5 µm are typical depending on material and wavelength. In SLE mode, internal glass features from 1–10 µm are achievable. The system’s 1 nm stage resolution and ±300 nm positioning accuracy support the sub-200 nm MPP feature placement precision required for these nano-scale printed structures.
Is the system suitable for production or only research?
The Hybrid 3D Nanofactory is ideal for research, rapid prototyping, and low-volume precision manufacturing where the combination of four fabrication processes and maximum design freedom is required. It is not optimised for high-volume production of a single product type — for that, dedicated single-process platforms with production automation modules (such as the GFH GmbH platforms or the Akoneer SLE system with production automation) are more appropriate. For organisations producing unique or small-batch precision micro-nano devices where process flexibility and design freedom are primary requirements, the Nanofactory provides unmatched fabrication capability.
What wavelengths and pulse durations are available?
The system provides wavelengths of 780 nm (primary MPP wavelength for two-photon absorption), 1030 nm ± 10 nm (high-power IR for SLE and metal ablation), and 515 nm ± 10 nm (green for surface patterning and finer feature resolution). Pulse durations include < 100 fs, 50 fs, 120 fs, and 170 fs in different configurations — the 50 fs option provides the most extreme cold-ablation confinement for the highest precision nano-machining applications. Repetition rates of 100 MHz and tuneable 11–76 MHz are available for optimisation of MPP dose rate and SLE modification efficiency.
What materials can the Hybrid 3D Nanofactory process?
The system processes photopolymer resins including IP-Dip, IP-Q, OrmoComp, and other two-photon resins for MPP printing; fused silica, borosilicate glass, and quartz for SLE; thin metals including gold, silver, and aluminium for surface ablation and patterning; semiconductor substrates including silicon and GaAs for ablation and dicing; and hybrid material assemblies combining multiple materials in a single device. Contact United Spectrum Instruments for compatibility assessment for your specific materials and device architecture: sales@unitedspectrum.in.
Can the system be expanded in the future with additional capabilities?
Yes. The open architecture of the Femtika Nanofactory allows integration of additional laser sources (for new wavelengths or pulse energies), high-NA objectives (for different working distances and voxel sizes), beam shaping modules including spatial light modulators (for voxel shape control and holographic multi-spot printing), vision and metrology modules (for in-process alignment verification and quality inspection), and automation handling options (for substrate loading and batch processing). Planned expansions should be discussed with United Spectrum Instruments before purchase to ensure the base configuration is compatible with intended future modules.
How does the MPP process in the Nanofactory compare to commercial SLA or DLP 3D printing?
Commercial SLA (stereolithography) and DLP (digital light processing) are single-photon photopolymerisation processes — the UV light used for curing is absorbed throughout the irradiated volume proportionally to light intensity, limiting minimum feature sizes to the diffraction limit of the UV wavelength (approximately 200–500 nm at best, in practice 20–100 µm for commercial SLA/DLP systems). MPP uses two-photon absorption, which scales as the square of intensity — only polymerising at the peak intensity of the tightly focused femtosecond focal volume, with a polymerised voxel smaller than the laser wavelength. This gives MPP approximately 100× finer feature resolution than commercial SLA/DLP, true 3D freeform capability without layer-by-layer restrictions, and the ability to print structures with overhangs and enclosed voids without support structures — at the cost of lower throughput (single-point scanning vs. area exposure).
What are the key applications of the Hybrid 3D Nanofactory in India?
In India, the Nanofactory is most relevant for biomedical microdevice research at IITs, AIIMS, NCBS, and CSIR developing microneedles, tissue scaffolds, and implantable biosensors; microfluidics and lab-on-chip research groups developing integrated glass-polymer diagnostic chips; photonics and optofluidics groups fabricating hybrid photonic-fluidic devices at IITs and TIFR; micro-robotics and MEMS researchers at IITs and DRDO; semiconductor packaging groups developing MPP polymer coupling structures for photonic chip packaging; and deep-tech start-ups requiring the broadest possible micro-nano fabrication design freedom for novel device development. United Spectrum Instruments supports all of these groups with installation, training, and ongoing application support.
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FAQs
What makes the Hybrid 3D Laser Nanofactory different from standard laser microfabrication tools?
The Femtika Hybrid 3D Laser Nanofactory is the only platform in the product range that combines additive manufacturing (Multiphoton Polymerisation — 3D printing of polymer structures with sub-200 nm feature resolution) with subtractive processes (SLE internal glass structuring, laser ablation for surface machining, and laser cutting) within a single workstation. This additive-subtractive hybrid capability enables the fabrication of a completely new category of integrated micro-nano devices — combining polymer 3D-printed micro-elements with glass microfluidic channels, surface-machined semiconductor features, and precision-cut substrates — all co-registered to ±300 nm within the same workholding fixture, without inter-machine substrate transfer and the alignment errors it introduces. No single-process platform can address this fabrication requirement. Available in India through United Spectrum Instruments.
What is Multiphoton Polymerisation (MPP) and what feature sizes does it achieve?
Multiphoton Polymerisation (MPP), also called Two-Photon Polymerisation (2PP), is a laser 3D printing process where a femtosecond laser beam focused to a diffraction-limited spot inside a photopolymer resin initiates polymerisation only at the focal volume through nonlinear two-photon absorption — breaking the conventional optical diffraction limit. The polymerised voxel (the 3D printing element) can be as small as approximately 150–200 nm laterally at 780 nm wavelength with a high-NA objective. By scanning this sub-wavelength voxel through any programmed 3D path, arbitrary polymer geometries — including overhangs, enclosed voids, and complex freeform shapes impossible in conventional additive manufacturing — can be built with sub-200 nm feature resolution
Can embedded microchannels inside glass be fabricated on this system?
Yes. The Selective Laser Etching (SLE) capability of the Hybrid 3D Nanofactory creates complex, enclosed microchannels and hollow structures inside transparent glass substrates — using femtosecond laser modification of the glass volume followed by selective chemical etching that removes only the laser-modified regions. The defining advantage over a standalone SLE system is that these SLE-fabricated glass microfluidic channels are co-fabricated with MPP-printed polymer elements — valves, actuators, optical coupling structures — in the same workstation at ±300 nm registration accuracy, enabling fully integrated hybrid optofluidic and microfluidic devices that cannot be assembled from separately fabricated components.
What is the minimum feature size achievable on the Hybrid 3D Nanofactory?
In Multiphoton Polymerisation (MPP) mode, features down to approximately 200 nm can be achieved in 3D-printed polymer structures, depending on the photopolymer resin, objective numerical aperture, and laser pulse parameters. In laser ablation mode, surface features to approximately 1–5 µm are typical depending on material and wavelength. In SLE mode, internal glass features from 1–10 µm are achievable. The system’s 1 nm stage resolution and ±300 nm positioning accuracy support the sub-200 nm MPP feature placement precision required for these nano-scale printed structures.
Is the system suitable for production or only research?
The Hybrid 3D Nanofactory is ideal for research, rapid prototyping, and low-volume precision manufacturing where the combination of four fabrication processes and maximum design freedom is required. It is not optimised for high-volume production of a single product type — for that, dedicated single-process platforms with production automation modules (such as the GFH GmbH platforms or the Akoneer SLE system with production automation) are more appropriate. For organisations producing unique or small-batch precision micro-nano devices where process flexibility and design freedom are primary requirements, the Nanofactory provides unmatched fabrication capability.
What wavelengths and pulse durations are available?
The system provides wavelengths of 780 nm (primary MPP wavelength for two-photon absorption), 1030 nm ± 10 nm (high-power IR for SLE and metal ablation), and 515 nm ± 10 nm (green for surface patterning and finer feature resolution). Pulse durations include < 100 fs, 50 fs, 120 fs, and 170 fs in different configurations — the 50 fs option provides the most extreme cold-ablation confinement for the highest precision nano-machining applications. Repetition rates of 100 MHz and tuneable 11–76 MHz are available for optimisation of MPP dose rate and SLE modification efficiency.
What materials can the Hybrid 3D Nanofactory process?
The system processes photopolymer resins including IP-Dip, IP-Q, OrmoComp, and other two-photon resins for MPP printing; fused silica, borosilicate glass, and quartz for SLE; thin metals including gold, silver, and aluminium for surface ablation and patterning; semiconductor substrates including silicon and GaAs for ablation and dicing; and hybrid material assemblies combining multiple materials in a single device. Contact United Spectrum Instruments for compatibility assessment for your specific materials and device architecture: sales@unitedspectrum.in.
Can the system be expanded in the future with additional capabilities?
Yes. The open architecture of the Femtika Nanofactory allows integration of additional laser sources (for new wavelengths or pulse energies), high-NA objectives (for different working distances and voxel sizes), beam shaping modules including spatial light modulators (for voxel shape control and holographic multi-spot printing), vision and metrology modules (for in-process alignment verification and quality inspection), and automation handling options (for substrate loading and batch processing). Planned expansions should be discussed with United Spectrum Instruments before purchase to ensure the base configuration is compatible with intended future modules.
How does the MPP process in the Nanofactory compare to commercial SLA or DLP 3D printing?
Commercial SLA (stereolithography) and DLP (digital light processing) are single-photon photopolymerisation processes — the UV light used for curing is absorbed throughout the irradiated volume proportionally to light intensity, limiting minimum feature sizes to the diffraction limit of the UV wavelength (approximately 200–500 nm at best, in practice 20–100 µm for commercial SLA/DLP systems). MPP uses two-photon absorption, which scales as the square of intensity — only polymerising at the peak intensity of the tightly focused femtosecond focal volume, with a polymerised voxel smaller than the laser wavelength. This gives MPP approximately 100× finer feature resolution than commercial SLA/DLP, true 3D freeform capability without layer-by-layer restrictions, and the ability to print structures with overhangs and enclosed voids without support structures — at the cost of lower throughput (single-point scanning vs. area exposure).
What are the key applications of the Hybrid 3D Nanofactory in India?
In India, the Nanofactory is most relevant for biomedical microdevice research at IITs, AIIMS, NCBS, and CSIR developing microneedles, tissue scaffolds, and implantable biosensors; microfluidics and lab-on-chip research groups developing integrated glass-polymer diagnostic chips; photonics and optofluidics groups fabricating hybrid photonic-fluidic devices at IITs and TIFR; micro-robotics and MEMS researchers at IITs and DRDO; semiconductor packaging groups developing MPP polymer coupling structures for photonic chip packaging; and deep-tech start-ups requiring the broadest possible micro-nano fabrication design freedom for novel device development. United Spectrum Instruments supports all of these groups with installation, training, and ongoing application support.









